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IBM Journal of Research and Development

Volumn 45, Issue 5, 2001, Pages 651-665

TCAD development for lithography resolution enhancement

(6) Liebmann, L W a Mansfield, S M a Wong, A K a Lavin, M A a Leipold, W C a Dunham, T G a

a IBM MICROELECTRONICS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; INTEGRATED CIRCUIT MANUFACTURE; LOGIC DESIGN; OPTICAL RESOLVING POWER;

OFF-AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTION; PHASE-SHIFTED-MASK-ENHANCED LITHOGRAPHY; SUBRESOLUTION-ASSIST-FEATURE-ENHANCED LITHOGRAPHY; TECHNOLOGY COMPUTER AIDED DESIGN;

PHOTOLITHOGRAPHY;

EID: 0035465564 PISSN: 00188646 EISSN: None Source Type: Journal
DOI: 10.1147/rd.455.0651 Document Type: Article

Times cited : (87)

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