Monte Carlo method for highly efficient and accurate statistical lithography simulations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1118-1126

  Postnikov, Sergei ^a   Lucas, Kevin ^a   Wimmer, Karl ^a   Ivin, Vladimir ^b   Rogov, Andrey ^b  

^a MOTOROLA INC   (United States)

^b SOFTTEC   (United States)

Author keywords

ACLV; AWLV; CD control; CD error budget; Focus and dose error budget; Lithography process optimization; MEF; Monte Carlo simulation; VTRM

Indexed keywords

BENCHMARKING; COMPUTER SIMULATION; ERROR ANALYSIS; MONTE CARLO METHODS; STATISTICAL METHODS;

CRITICAL DIMENSION (CD) DISTRIBUTION;

LITHOGRAPHY;

EID: 0036411565     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474492     Document Type: Article

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