Characterisation and optimisation of CD control for 0.25 μm CMOS applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 555-563

  Ronse, Kurt ^a   De Beeck, Maaike Op ^a   Yen, Anthony ^a   Kim, Kee Ho ^a   Van den Hove, Luc ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; FOCUSING; LENSES; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; OPTIMIZATION;

CRITICAL DIMENSIONS CONTROL;

PHOTOLITHOGRAPHY;

EID: 0030313019     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240924     Document Type: Conference Paper

References (5)

1. CD control: The limiting factor for i-line and deep-UV lithography?
2. Modelling and simulation of a deep-ultraviolet acid hardening resist
3. Dissolution rate properties