Lithographic process window analysis by statistical means

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 484-491

  Bourov, Anatoly ^a   Postnikov, Sergei ^b   Lucas, Kevin ^b  

^a Rochester Institute of Technology   (United States)

^b MOTOROLA INC   (United States)

Author keywords

ACLV; AWLV; CD control; CD error budget; Focus and dose error budget; Lithography process optimization; Monte Carlo simulation; Process capability

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; MATRIX ALGEBRA; MONTE CARLO METHODS; OPTIMIZATION;

CRITICAL DIMENSIONS (CD);

LITHOGRAPHY;

EID: 0036031164     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473487     Document Type: Article

References (6)

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2. E. Charrier, C. Mack, "Yield modeling and enhancement for optical lithography," Proc. SPIE, 2440, pp.435-447, 1995.
3. A. Zeidler, et al., "Advanced statistical process control; controlling sub-0.18um lithography and other processes," Proc. of SPIE, 4344, pp.312-322, 2001.
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5. Chris A. Mack, A comprehensive Guide to Optical Lithography Simulation, Finle Technologies, Austin, 1997.
6. Sergei Postnikov, Kevin Lucas, Karl Wimmer, Vladimir Ivin, Andrey Rogov, "Monte Carlo method for highly efficient and accurate statistical lithography simulations" to be published in Proc. SPIE, 2002.