Impact of optimized illumination upon simple lambda based design rules for low K1 lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 797-808

  Postnikov, S ^a   Lucas, K ^a   Wimmer, K ^a  

^a MOTOROLA INC   (United States)

Author keywords

Bitcell patterning; Low K1 lithography; Off axis illumination

Indexed keywords

COMPUTER SIMULATION; LIGHTING; LOGIC DESIGN; OPTIMIZATION; PROCESS CONTROL; STATIC RANDOM ACCESS STORAGE;

BITCELL PATTERNING;

PHOTOLITHOGRAPHY;

EID: 0034764891     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436807     Document Type: Conference Paper

References (6)

1. Re-evaluating simple lambda based design roles for low K1 lithography process control
2. Status of ArF lithography for the 130nm technology node
3. Business dynamics of lithography at very low K1 factors
4. KrF lithography for 130nm