Contrast-based assist feature optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 179-187

  Torres, J A ^a   Granik, Y ^a   Capodieci, L ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Low k1 imaging; Micro lithography; Model Based Assist Features; OPC; Scattering Bars

Indexed keywords

IMAGE ANALYSIS; IMAGING TECHNIQUES; LIGHT SCATTERING; MASKS; OPTIMIZATION;

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0036415723     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474537     Document Type: Article

References (4)

1. Y. Granik, N. Cobb, "MEEF as a matrix", Proc. Photomask Technologies, BACUS 2001, in print.
2. J.A. Torres, D. Chow, P. de Dood, D.J. Albers, "RET Compliant Cell Generation for sub-130nm Processes", Proc. SPIE, in print.
3. Socha et al. "Forbidden Pitches for 130 nm lithography and below", in Optical Microlithography XIII, Proc. SPIE Vol.4000 (2000), 1140-1155.
4. N. Cobb, A. Zakhor, "Fast sparse aerial image calculation for OPC", Proc. SPIE. 2621, pp.534-535, 1995.