Variable threshold resist models for lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 176-182

  Randall, John ^a   Ronse, Kurt ^a   Marschner, Thomas ^a   Goethals, Mieke ^a   Ercken, Monique ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENT LIGHT; COMPUTER SIMULATION; MATHEMATICAL MODELS;

CRITICAL DIMENSIONS (CD); VARIABLE THRESHOLD RESIST MODELS;

PHOTORESISTS;

EID: 0032636562     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354329     Document Type: Conference Paper

References (4)