Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4181, Issue , 2000, Pages 58-67

  Capodieci, Luigi ^a   Torres, Juan Andres ^a   Socha, Robert J ^a   Hollerbach, Uwe ^a   Chen, J Fung ^a   van Os, Christian ^b   Granik, Yuri ^c   Toublan, Olivier ^c   Cobb, Nickolas B ^c  

^a ASML US Inc   (United States)

^b ASML   (Netherlands)

^c MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SOURCES; OPTIMIZATION; PROCESS ENGINEERING; PRODUCT DESIGN; STATISTICAL METHODS;

OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0034541668     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.395751     Document Type: Article

References (0)