Impact of photoacid generator structure on DUV resist performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 785-799

  Cameron, James F ^a   Ablaza, Sheri L ^a   Xu, Guangyu ^a   Yueh, Wang ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHROMOPHORES; DISSOLUTION;

PHOTOACID GENERATORS;

PHOTORESISTS;

EID: 0032651659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350268     Document Type: Conference Paper

References (20)