Accurate measurement of spherical and astigmatic aberrations by a phase shift grating reticle

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 11, 2002, Pages 6316-6322

  Nomura, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Aberration; Coherent factor; Diffraction grating; Phase shift mask; Photolithography

Indexed keywords

ABERRATIONS; COHERENT LIGHT; DIFFRACTION GRATINGS; EXCIMER LASERS; PHASE SHIFT; STRUCTURE (COMPOSITION);

COHERENT FACTOR; PHASE SHIFT GRATING; PHASE SHIFT MASK;

PHOTOLITHOGRAPHY;

EID: 0036155488     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.6316     Document Type: Article

References (17)