Measurement of spherical aberration utilizing an alternating phase shift mask

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 11, 1998, Pages 5949-5955

  Nakao, Shuji ^a   Nakae, Akihiro ^a   Sakai, Junjirou ^a   Miura, Tamaki ^a   Tatsu, Shin Ichirou ^a   Tsujita, Kouichirou ^a   Wakamiya, Wataru ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Alternating phase shift mask; Highly coherent illumination; Optical lithography; Resolution enhancement techniques; Spherical aberration

Indexed keywords

ABERRATIONS; FUNCTIONS; MASKS; OPTICAL RESOLVING POWER; OPTICAL VARIABLES MEASUREMENT; PHASE SHIFT;

PHASE SHIFT MASKS (PSM); SPHERICAL ABERRATION FUNCTION;

PHOTOLITHOGRAPHY;

EID: 0032204728     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5949     Document Type: Article

References (6)

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6. J. Miyazaki, A. Nakae, H. Kusunose, N. Yoshioka, W. Wakamiya and K. Murayama: Jpn. J. Appl. Phys. 33 (1994) 6785.