Measurement of effective source shift using a grating-pinhole mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 99-107

  Sato, Kazuya ^a   Tanaka, Satoshi ^a   Fujisawa, Tadahito ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; MASKS;

CONDENSER ABERRATIONS; GRATING-PINHOLE MASKS;

PHOTORESISTS;

EID: 0032656714     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354402     Document Type: Conference Paper

References (10)