Measurment of astigmatism in microlithography lenses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 848-854

  Kirk, Joseph P ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Aberrations; Astigmatism; Focus; Lens quality

Indexed keywords

ABERRATIONS; LENSES; LITHOGRAPHY;

ASTIGMATISM; CIRCUIT FABRICATION; FABRICATION ERRORS; FOCUS; HIGH QUALITY (HQ); LENS QUALITY;

OPTICAL INSTRUMENTS;

EID: 58649088688     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310819     Document Type: Conference Paper

References (6)

1. J.P. Kirk, "Astigmatism and field curvature from pin-bars", SPIE Vol. 1463, (1991), p. 282.
2. T. Adams, "Applications of latent image metrology in microlithography", SPIE Vol. 1464 (1991), p. 294
3. J.P. Kirk, "Measurement of Astigmatism in Microlithography Lenses", OSA Annual Meeting, 1993 Technical Digest, Vol. 16.
4. J.P. Kirk, MS Hibbs," DUV diagnostics using continuous tone photoresist", SPIE Vol. 1463, p 575, 1991
5. The diffraction of normal incidence light by this 376nm period grating is beyond cutoff but is detected by using the "image enhancement" of dark field illumination.
6. D.G. Flagello, R. Rogoff, "The influence of photoresist on the optical performance of high NA steppers", SPIE Vol. 2440,1995