Measurement method for odd component of aberration function utilizing alternating phase shift mask

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6709-6713

  Nakao, Shuji ^a   Miyazaki, Junji ^a   Tsujita, Kouichirou ^a   Wakamiya, Wataru ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Alternating PSM; Capacitance measurement; Coma aberration; High coherent illumination; Odd pupil function; Optical lithography; Peak detection

Indexed keywords

EID: 0001131371     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6709     Document Type: Article

References (7)

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