Coma aberration measurement by relative shift of displacement with pattern dependence

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 6 A, 1998, Pages 3553-3557

  Sato, Takashi ^a   Nomura, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Coma aberration; Displacement; Illumination; Lens; Lithography; LSI; Measurement; Simulation; Stepper

Indexed keywords

EID: 0000242877     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3553     Document Type: Article

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