Simulations and experiments with the phase shift focus monitor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 236-243

  Brunner, T A ^a   Mih, R D ^a  

^a IBM   (United States)

Author keywords

Depth of focus; Focus budget; Focus control; Focus metrology; Lens heating; Lithography; Optical lithography; Process control; Process window; Simulation; Stepper control

Indexed keywords

ABERRATIONS; CALIBRATION; COHERENT LIGHT; COMPUTER SIMULATION; DISPLAY DEVICES; FOCUSING; OPTICAL INSTRUMENT LENSES; PHASE SHIFT; PHOTOMAPPING; PHOTORESISTS; PROCESS CONTROL;

LENS HEATING;

PHOTOLITHOGRAPHY;

EID: 0030314902     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240909     Document Type: Conference Paper

References (11)

1. New focus metrology technique using special test mask
2. Quantitative stepper metrology using the focus monitor test mask
3. Using the focus monitor test mask to characterize lithographic performance
4. Characterization and monitoring of variable NA and variable coherence capable photo steppers utilizing the phase shift focus reticle
5. Detailed study of a phase-shift focus monitor
6. Impact of local partial coherence variation on exposure tool performance
7. Zemike circle polynomials and optical aberrations of systems with circular pupils
8. Impact of lens aberrations on optical lithography
9. Stepper self-metrology using automated techniques
10. How focus budgets are spent: Limitation of advanced I-Line lithography