Evaluation of coma aberration in projection lens by various measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 297-308

  Saito, Takashi ^a   Watanabe, Hisashi ^a   Okuda, Yoshimitsu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Coma aberration; De centering coma aberration; Feature size; Image quality; Pattern asymmetry; Side lobe

Indexed keywords

IMAGE QUALITY; KRYPTON; LENSES; OPTICAL INSTRUMENTS; PHASE SPACE METHODS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

COMA ABERRATION; DE-CENTERING COMA ABERRATION; FEATURE SIZE; PATTERN ASYMMETRY; SIDE LOBE;

ABERRATIONS;

EID: 0001387797     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310759     Document Type: Conference Paper

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