Aberration measurement from specific photolithographic images: A different approach

Applied Optics

Volumn 39, Issue 7, 2000, Pages 1136-1147

  Nomura, Hiroshi ^a   Tawarayama, Kazuo ^a   Kohno, Takuya ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; DIFFRACTION GRATINGS; IMAGE PROCESSING; LENSES; PATTERN MATCHING;

LENS ABERRATIONS;

PHOTOLITHOGRAPHY;

EID: 0000861717     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.001136     Document Type: Article

References (17)

1. T. Brunner, “Impact of lens aberrations on optical lithography, ” IBM J. Res. Dev. 41, 57-67 (1997).
2. D. G. Flagello and B. Geh, “Lithographic lens testing: analysis of measured aerial images, interferometric data, and photoresist measurements, ” in Optical Microlithography IX, G. E. Fuller, ed., Proc. SPIE 2726, 788-798 (1996).
3. D. Malacara, Optical Shop Testing(Wiley, New York, 1978).
4. R. P. Grosso and R. Crane, “Precise optical evaluation using phase monitoring interferometric techniques, ” in Interferome-try, G. Hopkins, ed., Proc. SPIE 192, 65-74 (1979).
5. J. P. Kirk, “Astigmatism and field curvature from pin-bars, ” in Optical/Laser Microlithography IV, V. Pol, ed., Proc. SPIE 1463, 282-291 (1991).
6. J. P. Kirk, “Measurement of astigmatism in microlithography lenses, ” in Optical Microlithography XI, L. V. den Hove, ed., Proc. SPIE 3334, 848-854 (1998).
7. T. Saito, H. Watanabe, and Y. Okuda, “Evaluation of coma aberration in projection lens by various measurements, ” in Optical Microlithography XI, L. van Den Hove, ed., Proc. SPIE 3334, 297-308 (1998).
8. T. Saito, H. Watanabe, and Y. Okuda, “Effect of variable sigma aperture on lens distortion and its pattern size dependence, ” in Metrology, Inspection, and Process Control for Microlithography X, S. K. Jones, ed., Proc. SPIE 2725, 414-423 (1996).
9. T. Saito, H. Watanabe, and Y. Okuda, “Overlay error of fine patterns by lens aberration using modified illumination, ” in Optical Microlithography X, G. E. Fuller, ed., Proc. SPIE 3051, 686-696 (1997).
10. T. Sato and H. Nomura, “Coma aberration measurement by relative shift of displacement with pattern dependence, ” Jpn. J. Appl. Phys. 37, 3553-3557 (1998).
11. C. Progler and D. Wheeler, “Optical lens specifications from the user’s perspective, ” in Optical Microlithography XI, L. van Den Hove, ed., Proc. SPIE 3334, 256-268 (1998).
12. S. Nakao, A. Nakae, J. Sakai, T. Miura, S. Tatsu, K. Tsujita, and W. Wakamiya, “Measurement of spherical aberration utilizing an alternating phase shift mask, ” Jpn. J. Appl. Phys. 37, 5949-5955 (1998).
13. S. Nakao, J. Miyazaki, K. Tsujita, and W. Wakamiya, “Measurement method for odd component of aberration function utilizing alternating phase shift mask, ” Jpn. J. Appl. Phys. 37, 6709-6713 (1998).
14. H. Nomura and T. Sato, “Techniques for measuring aberrations in lenses used in photolithography with printed patterns, ” Appl. Opt. 38, 2800-2807 (1999).
15. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, Oxford, 1980).
16. R. R. Shannon and J. C. Wyant, Applied Optics and Optical Engineering(Academic, San Diego, Calif., 1992), Vol. XI.
17. K. Sato, S. Tanaka, T. Fujisawa, and S. Inoue, “Measurement of the effective source shift using a grating-pinhole mask, ” in Optical Microlithography XII, L. van Den Hove, ed., Proc. SPIE 3679, 99-107 (1999).