A novel technique for measuring defocus with phase shift gratings on a photomask

Optical Review

Volumn 8, Issue 3, 2001, Pages 184-190

  Nomura, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Coherent factor; Focus; Grating; Phase shift mask; Photolithography

Indexed keywords

EID: 0035528323     PISSN: 13406000     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10043-001-0184-4     Document Type: Article

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