Rates of reactions of H atoms with some CVD precursors

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 176-180

  Arthur, Neville L ^a   Cooper, Ian A ^b   Czerwinski, Alex ^a   Miles, Luke A ^a  

^a LA TROBE UNIVERSITY   (Australia)

^b ASTRAZENECA   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FREE RADICALS; HYDROGEN; PHOTOLYSIS; RATE CONSTANTS; THERMAL EFFECTS;

FLASH PHOTOLYSIS; PULSED PHOTOLYSIS; THERMOCHEMISTRY;

SEMICONDUCTING FILMS;

EID: 0033722863     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00760-4     Document Type: Article

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