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Journal of Materials Science

Volumn 36, Issue 22, 2001, Pages 5397-5401

Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach

(4) Akiyama, M a Alexandrou, I b Chhowalla, M b Amaratunga, G A J b

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; ELASTIC MODULI; ELASTICITY; HARDNESS; MAGNETRON SPUTTERING; STATISTICAL METHODS; THERMAL EFFECTS;

ANALYSIS OF VARIANCE; SPUTTERING TIME;

CARBON NITRIDE;

EID: 0035891108 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/A:1012461026119 Document Type: Article

Times cited : (2)

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