Statistical approach for optimizing sputtering conditions of highly oriented aluminum nitride thin films

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 62-65

  Akiyama, Morito ^a   Xu, Chao Nan ^a   Nonaka, Kazuhiro ^a   Shobu, Kazuhisa ^a   Watanabe, Tadahiko ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Aluminum nitride; Crystallization; Sputtering; X ray diffraction

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLIZATION; NITRIDES; NITROGEN; OPTIMIZATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SPUTTER DEPOSITION; STATISTICAL METHODS; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE; ANALYSIS OF VARIANCE (ANOVA);

SEMICONDUCTING FILMS;

EID: 0032473235     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00697-4     Document Type: Article

References (17)

1. A.J. Noreika, M.H. Francmbe, S.A. Zeitman, J. Vac. Sci. Technol. 6 (1969) 4.
2. J. Duchene, Thin Solid Films 8 (1971) 69.
3. T. Shiosaki, T. Yamamoto, T. Oda, A. Kawabata, Appl. Phys. Lett. 38 (1980) 643.
4. H. Okano, N. Tanaka, K. Shibata, S. Nakano, Jpn. J. Appl. Phys. 32 (1993) 4052.
5. M. Akiyama, H.R. Kokabi, K. Nonaka, K. Shobu, T. Watanabe, J. Am. Ceram. Soc. 78 (1995) 3304.
6. M. Akiyama, C.N. Xu, K. Nonaka, K. Shobu, T. Watanabe, J. Mater. Sci., submitted.
7. D.C. Montgomery, Design and Analysis of Experiments, 3rd edn., Wiely, New York, 1991.
8. V.L. Anderson, R.A. Mclean, Design of Experiments, A Realistic Approach, Marcel Dekker, New York, 1974.
9. R.G. Pererson, Design and Analysis of Experiments, Marcel Dekker, New York, 1985.
10. H.B. Wan, M.K. Wong, C.Y. Mok, J. Chrom, Science 33 (1995) 66.
11. R.E. McKeighen, IEEE Trans. Ultrason. Ferroelect. 43 (1996) 63.
12. I. Usui, F. Tamai, Y. Towata, T. Yamada, 12th Japan-Korea Seminar on Ceramics Proc. (1995) 225.
13. I. Usui, F. Tamai, Y. Towata, T. Yamada, J. Ceram. Soc. Jpn. 105 (1997) 97.
14. W.C. Guenther, Analysis of Variance, Prentice-Hall, Englewood Cliffs, NJ, 1964.
15. F. Takeda, T. Hata, Jpn. J. Appl. Phys. 19 (1980) 1001.
16. T. Shiosaki, M. Adachi, A. Kawabata, Thin Solid Films 96 (1982) 129.
17. X. Li, Z. Xu, Z. He, H. Cao, W. Su, Z. Chen, F. Zhou, E. Wang, Thin Solid Films 139 (1986) 261.