Preparation of crystalline carbon nitride films on silicon substrate by chemical vapor deposition

Diamond and Related Materials

Volumn 6, Issue 5-7, 1997, Pages 635-639

  Woo, H K ^a   Zhang, Yafei ^a   Lee, S T ^a   Lee, C S ^a   Lam, Y W ^a   Wong, K W ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Crystalline carbon nitride; d.c. r.f. plasma; Hot filament chemical vapor deposition; Silicon substrate

Indexed keywords

EID: 0000684060     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00615-2     Document Type: Article

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