Preparation of highly oriented AlN thin films on glass substrates by helicon plasma sputtering and design of experiments

Thin Solid Films

Volumn 350, Issue 1, 1999, Pages 85-90

  Akiyama, Morito ^a   Harada, Tomohiro ^a   Xu, Chao Nan ^a   Nonaka, Kazuhiro ^a   Watanabe, Tadahiko ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL ORIENTATION; FILM PREPARATION; FUSED SILICA; PLASMA APPLICATIONS; SPUTTER DEPOSITION; STATISTICAL METHODS; SUBSTRATES; THIN FILMS;

ALUMINUM NITRIDE; ANALYSIS OF VARIANCE (ANOVA); HELICON PLASMA SPUTTERING;

DIELECTRIC FILMS;

EID: 0032674582     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00284-9     Document Type: Article

References (35)

1. Akiyama M., Konaka K., Shobu K., Watanabe T. J. Ceram. Soc. Jpn. 103:1995;974.
2. Lee H.C., Yong Y.J., Lee J.Y. Eur. J. Solid State Inorg. Chem. 31:1994;513.
3. Noreika A.J., Francmbe M.H., Zeitman S.A. J. Vac. Sci. Technol. 6:1969;4.
4. Duchene J. Thin Solid Films. 8:1971;69.
5. Shiosaki T., Yamamoto T., Oda T., Kawabata A. Appl. Phys. Lett. 38:1980;643.
6. Okano H., Tanaka N., Shibata K., Nakano S. Jpn. J. Appl. Phys. 32:1993;4052.
7. Amano M. Ulvac Tech. J. 42:1995;26.
8. Setsuhara Y., Kamai M., Miyake S. Proc. ICRP-2/SPP-11 Yokohama. 1994;549.
9. Koike M., Suzuki I.H. Jpn. J. Appl. Phys. 34:1995;6754.
10. D.C. Montgomery. Design and Analysis of Experiments. 3 :1991;Wiley, New York.
11. V.L. Anderson, R.A. Mclean. Design of Experiments: A realistic approach. 1974;Marcel Dekker, New York.
12. R.G. Pererson,. Design and Analysis of Experiments. 1985;Marcel Dekker, New York.
13. Wan H.B., Wong M.K., Mok C.Y., Chrom J. Sci. 33:1995;66.
14. McKeighen R.E. IEEE Trans. Ultrason. Ferroelect. 43:1996;63.
15. Usui I., Tamai F., Towata Y., Yamada T. J. Ceram. Soc. Jpn. 105:1997;97.
16. Akiyama M., Xu C.N., Nonaka K., Shobu K., Watanabe T. Thin Solid Films. 1999.
17. W.C. Guenther. Analysis of Variance. Prentice-Hall. 1964;Englewood Cliffs, NJ.
18. Okano H., Takahashi Y., Tanaka T., Shibata K., Nakano S. Jpn. J. Appl. Phys. 31:1992;3446.
19. Akiyama M., Xu C.N., Nonaka K., Hagio T., Nishimura S., Shobu K., Watanabe T. J. Mater. Sci. 1999.
20. Givargizov E.I. Oriented Crystallization on Amorphous Substrates. 1991;Plenum Press, New York.
21. Takeda F., Hata T. Jpn. J. Appl. Phys. 19:1980;1001.
22. Penza M., De M.F. Riccardis. L. Mirenghi, M.A. Tagliente, E. Verona, Thin Solid Films. 259:1995;154.
23. Akiyama M., Kokabi H.R., Nonaka K., Shobu K., Watanabe T. J. Am. Ceram. Soc. 78:1995;3304.
24. Thornton J.A. J. Vac. Sci. Technol. 11:1974;3059.
25. Nat. Bur.Stand. (US) Monogr. 25 (1975) 12.
26. Cullity B. Elements of X-ray Diffraction. 1955;Addison-Welsey, London.
27. Takahashi T., Takeda F., Ikeda N., Naoe M. Bull. Faculty Eng. Toyama Univ. 1991;43.
28. Okano H., Tanaka T., Shibata K., Nakano S. Jpn. J. Appl. Phys. 31:1992;3017.
29. Shiosaki T., Adachi M., Kawabata A. Thin Solid Films. 96:1982;129.
30. Xinjiao L., Zechuan X., Ziyou H., et al. Thin Solid Films. 139:1986;261.
31. Soh J.W., Kim J.H., Lee W.J. Jpn. J. Appl. Phys. 35:1996;L1518.
32. Tominaga K., Iwamura S., Shintani Y., Tada O. Jpn. J. Appl. Phys. 22:1983;418.
33. Takeda F., Mori T., Takahashi T. Jpn. J. Appl. Phys. 20:1981;L169.
34. Kim I.H., Kim S.H. Thin Solid Films. 253:1994;47.
35. Vispute R.D., Narayan J., Wu H., Jagannadham K. J. Appl. Phys. 77:1995;4724.