X-ray diffraction analysis on the RF-CVD deposited carbon nitride films

Solid State Communications

Volumn 103, Issue 3, 1997, Pages 193-196

  Wu, D W ^a   Fan, W ^a   Guo, H X ^a   He, M B ^a   Meng, X Q ^a   Fan, X J ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

A. thin film; B. crystal growth; C. crystal structure; E. X ray spectroscopy

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL STRUCTURE; CRYSTALLIZATION; LATTICE CONSTANTS; SILICON NITRIDE; SILICON WAFERS; STEEL; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROSCOPY;

BUFFER LAYER; CARBON NITRIDE FILMS; POST TREATMENT;

THIN FILMS;

EID: 0031188914     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(97)00158-0     Document Type: Article

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