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Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 419-426

Implementation of COMA type ArF resist for sub-100nm patterning

(8) Jung, Jae Chang a Lee, Sung Ku a Lee, Guensu a Koh, Cha Won a Kong, Keun Kyu a Hwang, Young Sun a Kim, Jin Soo a Shin, Ki Soo a

a Hynix Semiconductor Inc (South Korea)

Author keywords

ArF resist; COMA(cycloolefin maleic anhydride); Photolithography

Indexed keywords

ALKENE DERIVATIVE; MALEIC ANHYDRIDE; OXIDE;

ARTICLE; DEVICE; DIPOLE; EXCIMER LASER; ILLUMINATION; MEASUREMENT; TECHNOLOGY;

EID: 0035755028 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.419 Document Type: Article

Times cited : (4)

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