Adhesion-promoted copolymers for 193-nm photoresists without cross-linking during lithographic process

Journal of Photopolymer Science and Technology

Volumn 13, Issue 4, 2000, Pages 629-634

  Kim, Jin Baek ^a   Yun, Hyo Jin ^a   Kwon, Young Gil ^a   Lee, Bum Wook ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Adhesion; ArF excimer laser lithography; Cross linking; Shelf life stability

Indexed keywords

ARGON; CARBOXYLIC ACID DERIVATIVE; COPOLYMER; ESTER; FLUORINE; MALEIC ANHYDRIDE; NORBORNENE DERIVATIVE; POLYMER; SILICON;

ADHESION; ARTICLE; CROSS LINKING; EXCIMER LASER; HYDROPHILICITY; LITHOGRAPHY; PHOTOCHEMISTRY; SHELF LIFE; SYNTHESIS; TECHNOLOGY;

EID: 0034584080     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.629     Document Type: Article

References (15)