Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 36-43

  Kim, Jin Baek ^a   Lee, Bum Wook ^a   Kang, Jae Sung ^a   Kim, Seong Ju ^a   Park, Joo Hyeon ^a   Seo, Dong Chul ^a   Baik, Ki Ho ^a   Jung, Jae Chang ^a   Roh, Chi Hyung ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERIZATION; COPOLYMERS; DRY ETCHING; FREE RADICAL POLYMERIZATION; OPACITY;

NORBORNENE COPOLYMERS; STEROID DERIVATIVES;

PHOTORESISTS;

EID: 0032647921     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350194     Document Type: Conference Paper

References (8)