Progress in 193 nm positive resists

Journal of Photopolymer Science and Technology

Volumn 9, Issue 3, 1996, Pages 465-474

  Allen, R D ^a,b,c   Soortyakumaran, R ^a,b,c   Optcz, J ^a,b,c   Wallraff, G M ^a,b,c   Breyta, G ^a,b,c   Dipffitro, R A ^a,b,c   Hofer, D C ^a,b,c   Rrkunz, ^a,b,c   Okoroanyanwu, U ^a,b,c   Willson, C G ^a,b,c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b MIT LINCOLN LABORATORY   (United States)

^c UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 20244362409     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.465     Document Type: Article

References (15)

1. R. D. Allen, G. M. Wallraff, R. A. DiPietro, D. C. Hofer and R. R. Kunz, Proc. SPIE, 2438, 474 (1995);
2. R. D. Allen, et al., J. Pholopolym. Sei. Technol, 8(4), 623 (1995).
3. R. Allen, R. Sooriyakumaran, J. Opitz, G. Wallraff, R. DiPietro, G. Breyta, D. Hofer, R. Kunz, S. Jayaraman, R. Shick, B. Goodall, U. Okoroanyanwu, and C. Willson, Proc.SPIE, 2724, in press (1996).
4. For a recent review, see R. D. Allen, G. M. WallrafF, D. C. Hofer, R. R. Kunz, S. C. Palmateer, and M. W. Horn, Photoresists for 193-tm Lithography, Microlithography World, 21, Summer 1995.
5. Y. Kaimoto, K. Nozaki, S. Takechi, and N. Abe, Proc. SPIE, 1672, 66 (1992).
6. R. R. Kunz, R. D. Allen, W. D. Hinsberg, and G. M. Wallraff, Proç. SPIE, 1925, 167 (1993);
7. R. D. Allen, G. M. Wallraff, W. D. Hinsberg, W. E. Conley and R. R. Kunz, J. Photopolym. Sei. Technol., 6(4) 575 (1993).
8. K. Maeda, K. Nakano, T. Ohfuji, and E. Hasegawa, Proc.SPIE, 2724, in press (1996).
9. K. Nozaki, et al., International Chem. Congress of Pacific Basin Soc., Honolulu, December (1995).
10. H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo, and D. Seeger, J. Photopolymer Sei. Tech., 7,433 (1994).
11. also, W. E. Conley et al., Proc.SPIE, 2724, in press (1996).
12. G. M. Wallraff, R. D. Allen, W. D. Hinsberg, C. E. Larson, R. D. Johnson, R. A. DiPietro, G. Breyta, N. Hacker, J. Vac. Sei. Technol, B 11, 2783 (1993).
13. R. R. Kunz, S. C. Palmateer, A. R. Forte, R. D. Allen, G. M. Wallraff, R. A. DiPietro, and D. C. Hofer, Proc.SPIE, 2724, in press (1996).
14. D. R. McKean, R. D. Allen, P. H. Kasai, U. P. Schaedeli, and S. A. MacDonald, Proc. SPIE, 1672, 94 (1992).
15. N. Kihara, S. Saito, T. Ushirogouchi and M. Nakase, J. Photopolym. Sei. Technol., 8(4), 561 (1995).