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Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 393-400

Effect of comonomer structure on dissolution characteristics: ArF negative resist system using androsterone derivative with δ-hydroxy acid

(5) Yokoyama, Yoshiyuki a Hattori, Takashi a Kimura, Kaori a Tanaka, Toshihiko a Shiraishi, Hiroshi a

a HITACHI LTD (Japan)

Author keywords

Androsterone; ArF phase shifting lithography; Intramolecular esterification; Negative resist

Indexed keywords

ACID; ACRYLIC ACID; ANDROSTERONE DERIVATIVE; HYDROXYACID; MONOMER; POLYMER;

AQUEOUS SOLUTION; ARTICLE; CATALYSIS; CHEMICAL STRUCTURE; DISSOLUTION; ESTERIFICATION; EXCIMER LASER; GENERATOR; HYDROPHILICITY; HYDROPHOBICITY; SOLUBILITY;

EID: 0035754475 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.393 Document Type: Article

Times cited : (3)

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