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Volumn 672, Issue , 2001, Pages
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Crystallographic texture characterization of inlaid copper interconnects
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL MECHANICAL POLISHING;
CRYSTAL MICROSTRUCTURE;
CRYSTAL ORIENTATION;
CRYSTALLOGRAPHY;
CURRENT DENSITY;
ELECTROMIGRATION;
GRAIN BOUNDARIES;
GRAIN GROWTH;
INTERDIFFUSION (SOLIDS);
INTERFACES (MATERIALS);
TEXTURES;
TRANSPORT PROPERTIES;
COPPER INTERCONNECTS;
CRYSTALLOGRAPHIC TEXTURE;
ELECTRON BACKSCATTERED DIFFRACTION;
COPPER COMPOUNDS;
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EID: 0035742248
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (36)
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