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Volumn 672, Issue , 2001, Pages

Crystallographic texture characterization of inlaid copper interconnects

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; CURRENT DENSITY; ELECTROMIGRATION; GRAIN BOUNDARIES; GRAIN GROWTH; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); TEXTURES; TRANSPORT PROPERTIES;

EID: 0035742248     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (36)
  • 27
    • 0003945367 scopus 로고    scopus 로고
    • Short course on reliability characterization methods for VLSI interconnects, SSDM
    • (1999)
    • Kawasaki, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.