Microtexture and electromigration-induced drift in electroplated damascene Cu

Journal of Applied Physics

Volumn 87, Issue 6, 2000, Pages 2792-2802

  Proost, J ^a,b   Hirato, T ^c   Furuhara, T ^c   Maex, K ^a,b   Celis, J P ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000484996     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372258     Document Type: Article

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