The role of texture in the electromigration behavior of pure aluminum lines

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2409-2417

  Knorr, D B ^a   Rodbell, K P ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001645678     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361168     Document Type: Article

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