Cu damascene interconnects with crystallographic texture control and its electromigration performance

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1998, Pages 342-347

  Abe, Kazuhide ^a   Harada, Yusuke ^a   Onoda, Hiroshi ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL LATTICES; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTROMIGRATION; TEXTURES; TITANIUM NITRIDE;

COPPER DAMASCENE INTERCONNECTS;

METALLIC FILMS;

EID: 0031706682     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/relphy.1998.670667     Document Type: Conference Paper

References (10)