Preparation of CNx/TiNy multilayers by ion beam sputtering

Journal of Crystal Growth

Volumn 233, Issue 1-2, 2001, Pages 303-311

  Yu, D L ^a   Tian, Y J ^a   He, J L ^a   Xiao, F R ^a   Wang, T S ^a   Li, D C ^a   Li, L ^b   Zheng, G ^c   Yanagisawa, O ^d  

^a YANSHAN UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

^c Institute of Hui Guang Technology   (China)

^d HIROSHIMA UNIVERSITY   (Japan)

Author keywords

A1. crystal structures; A3. polycrystalline deposition; B1. nitrides

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; EMISSION SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; MULTILAYERS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ATOMIC RATIOS; X-RAY PHOTOEMISSION SPECTROSCOPY;

SPUTTERING;

EID: 0035502042     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01492-0     Document Type: Article

References (27)