Phases and physical properties of carbon nitride thin films prepared by pulsed laser deposition

Materials Science and Engineering: A

Volumn 209, Issue 1-2, 1996, Pages 5-9

  Zhang, Z John ^a   Huang, Jinlin ^a   Fan, Shoushan ^a   Lieber, Charles M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Atomic beam techniques; Carbon nitride; Pulsed laser deposition

Indexed keywords

ANNEALING; ATOMIC BEAMS; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; IMPURITIES; INFRARED SPECTROSCOPY; LASER ABLATION; LASER APPLICATIONS; THIN FILMS;

ATOMIC BEAMS TECHNIQUE; CARBON NITRIDE; CARBON NITRIDE FILMS; PULSED LASER DEPOSITION;

CARBON INORGANIC COMPOUNDS;

EID: 0002477359     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5093(95)10097-0     Document Type: Article

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