Crystallization by post-treatment of reactive r.f.-magnetron-sputtered carbon nitride films

Diamond and Related Materials

Volumn 8, Issue 10, 1999, Pages 1906-1912

  Chen, G L ^a   Li, Y ^a   Lin, J ^a   Huan, C H A ^a   Guo, Y P ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Annealing; Carbon nitride; R.f. magnetron sputtering; Structure

Indexed keywords

ANNEALING; CHEMICAL BONDS; CRYSTALLIZATION; FILM GROWTH; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SINGLE CRYSTALS; SPUTTER DEPOSITION; ZIRCONIA;

CARBON NITRIDE; NANOFIBERS;

NITRIDES;

EID: 0032685577     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00155-7     Document Type: Article

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