Growth competition between crystalline silicon carbon nitrides and silicon nitrides deposited on Si wafer by MPCVD

Materials Chemistry and Physics

Volumn 72, Issue 2, 2001, Pages 245-250

  Wu, Jin Yu ^a   Kuo, Cheng Tzu ^a   Yang, Po Ju ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Electron microscopy; ESCA; Nitrides; Plasma assisted CVD; Thin films

Indexed keywords

CARBON NITRIDE; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SILICON WAFERS; TERNARY SYSTEMS; X RAY DIFFRACTION ANALYSIS;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);

THIN FILMS;

EID: 0035501507     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(01)00446-1     Document Type: Article

References (15)