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Volumn 72, Issue 2, 2001, Pages 290-295

Resistive heated MOCVD deposition of InN films

(7) Hwang, Jih Shang a Lee, Chung Han b Yang, Fuh Hsiang c Chen, Kuei Hsien a Hwa, Luu Gen b Yang, Ying Jay c Chen, Li Chyong c

a INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES (Taiwan)

b FU JEN CATHOLIC UNIVERSITY (Taiwan)

c NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

Electron microscopy; MOCVD; Nitrides; Optical properties

Indexed keywords

INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

INDIUM NITRIDE;

SEMICONDUCTING FILMS;

EID: 0035500476 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/S0254-0584(01)00455-2 Document Type: Article

Times cited : (14)

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