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Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 889-893

Nitrogen incorporation into boron carbide films deposited by dc-magnetron sputtering: Film microstructure and tribological properties

(2) Reigada, D C a Freire Jr , F L a

a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO (Brazil)

Author keywords

Boron carbide; Density; Nitrogen; Partial pressure

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON; FILMS; FRICTION; NITROGEN; OXYGEN; PARTIAL PRESSURE; SURFACE ROUGHNESS;

AMORPHOUS BORON CARBIDE FILMS;

COATING TECHNIQUES;

BORON CARBIDE; FILM; MICROSTRUCTURE; SPUTTERING; TRIBOLOGY;

EID: 0035386096 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01213-0 Document Type: Article

Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.