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Diamond and Related Materials

Volumn 9, Issue 3-6, 2000, Pages 489-493

Boron carbide films deposited by a magnetron sputter-ion plating process: Film composition and tribological properties

(4) Reigada, D C a Prioli, R a Jacobsohn, L G a Freire Jr , F L a

a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO (Brazil)

Author keywords

Atomic force microscopy; Rutherford backscattering; Sputtering; Tribology

Indexed keywords

AMORPHOUS FILMS; ARGON; ATOMIC FORCE MICROSCOPY; CONTAMINATION; FRICTION; IMPURITIES; MAGNETRON SPUTTERING; SILICON; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TRIBOLOGY; WEAR OF MATERIALS;

ION BEAM ANALYSIS (IBA);

BORON CARBIDE;

BORON CARBIDE; FILM; MICROSCOPY; TRIBOLOGY;

EID: 0034045717 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(99)00318-0 Document Type: Conference Paper

Times cited : (53)

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