Stress reduction in boron carbonitride films by ion energy-modulated multilayers

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 253-260

  Kratzsch, A ^a   Ulrich, S ^a   Leiste, H ^a   Stuber M ^a   Holleck, H ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Magnetron sputtering; Multilayer; Stress reduction

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; BORON COMPOUNDS; HARDNESS; INTERFACES (MATERIALS); ION BOMBARDMENT; MAGNETRON SPUTTERING; RESIDUAL STRESSES; SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

BORON CARBONITRIDE;

MULTILAYERS;

CERAMIC COATING; ION BOMBARDMENT; STRESS RELIEF;

EID: 0033400193     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00354-0     Document Type: Conference Paper

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