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Volumn 53, Issue 6, 2001, Pages 43-48
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Copper interconnects for semiconductor devices
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM ALLOYS;
COPPER;
HARDNESS;
PERMITTIVITY;
SEMICONDUCTOR DEVICES;
SILICA;
COPPER INTERCONNECTS;
DIELECTRIC FILM DEPOSITION;
DIELECTRIC FILMS;
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EID: 0035360088
PISSN: 10474838
EISSN: None
Source Type: Journal
DOI: 10.1007/s11837-001-0103-y Document Type: Article |
Times cited : (44)
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References (41)
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