157nm optical lithography: The accomplishments and the challenges

Solid State Technology

Volumn 42, Issue 6, 1999, Pages 57-68

  Mcclay, James A ^a   Mcintyre, Angela S L ^b  

^a SVG Lithography Systems Inc   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002623728     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. U. Stamm et al., "Excimer Laser for 157nm Lithography," Proceedings of SPIE, Volume 3676, paper 84, pending publication.
2. 2 Laser for DUV Microlithography," Proceedings of SPIE, Volume 3679, paper 49, pending publication.
3. C. Smith, L.A. Moore, "Fused Silica for 157nm Transmittance." Proceedings of SPIE, Volume 3676, paper 95, pending publication.
4. T.M. Bloomstein et al., "Lithography with 157nm Lasers," JVST B, Vol. 15, No. 6, Microelectronics and Nanometer Structures, MIT, pp. 2112-2116, Nov./Dec.1997.