Titanium-aluminum nitride film growth and related chemistry using dimethylamino-based precursors

Thin Solid Films

Volumn 385, Issue 1-2, 2001, Pages 66-73

  Endle, J P ^a,c   Sun, Y M ^b   Silverman, J ^b   Nguyen, N ^a   Cowley, A H ^b   White, J M ^b   Ekerdt, J G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM NITRIDE; CARBON; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; PYROLYSIS; SUBSTRATES; THERMAL EFFECTS; TITANIUM; TITANIUM NITRIDE;

DECOMPOSITION TEMPERATURE; DIMETHYLAMINO-BASED PRECURSORS; DIRECT LIQUID INJECTION; ORGANOMETALLIC VAPOR DEPOSITION;

FILM GROWTH;

EID: 0035311587     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01879-4     Document Type: Article

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