Comparative studies of TiN and Ti1-xAlxN by plasma-assisted chemical vapor deposition using a TiCl4/AlCl3/N2/H2/Ar gas mixture

Thin Solid Films

Volumn 283, Issue 1-2, 1996, Pages 165-170

  Kim, Kwang Ho ^a   Lee, Seong Ho ^a  

^a Pusan National University   (South Korea)

Author keywords

Chemical vapour deposition; Coatings; Hardness; Oxidation; Plasma processing and deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; CRYSTAL ORIENTATION; GRAIN SIZE AND SHAPE; HARDNESS; HIGH TEMPERATURE OPERATIONS; LATTICE CONSTANTS; MICROSTRUCTURE; MIXTURES; OXIDATION; PLASMA APPLICATIONS; TITANIUM COMPOUNDS;

GAS MIXTURE; MICROSTRUCTURAL CHANGES; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; RANDOM ORIENTED MICROSTRUCTURE;

THIN FILMS;

EID: 0030234267     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08766-4     Document Type: Article

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