Chemical vapor deposition of refractory ternary nitrides for advanced diffusion barriers

ACS Symposium Series

Volumn 727, Issue , 1999, Pages 86-99

  Custer, Jonathan S ^a   Smith, Paul Martin ^a   Fleming, James G ^a   Roherty Osmun, Elizabeth ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042913558     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1999-0727.ch007     Document Type: Article

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