Chemical vapor deposition of aluminum and gallium nitride thin films from metalorganic precursors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 306-311

  Hoffman, David M ^a   Rangarajan, Sri Prakash ^a   Athavale, Satish D ^b   Economou, Demetre J ^b   Liu, Jia Rui ^c   Zheng, Zongshuang ^c   Chu, Wei Kan ^c  

^a University of Houston   (United States)

^b University of Houston   (United States)

^c UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000178812     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579893     Document Type: Article

References (31)

1. L. M. Sheppard, Ceram. Bull. 69, 1801 (1990).
2. J. I. Pankove, Mater. Res. Soc. Symp. Proc. 162, 515 (1990).
3. I. Akasaki, H. Amano, Y. Koide, K. Hiramatsu, and N. Sawaki, J. Cryst. Growth 98, 209 (1989).
4. R. G. Gordon, U. Riaz, and D. M. Hoffman, J. Mater. Res. 7, 1679 (1992).
5. R. G. Gordon, D. M. Hoffman, and U. Riaz, Mater. Res. Soc. Symp. Proc. 242, 445 (1992).
6. S. Strite, M. E. Lin, and H. Morkoç, Thin Solid Films 231, 197 (1993).
7. D. M. Hoffman, S. P. Rangarajan, S. D. Athavale, D. J. Economou, J. R. Liu, Z. S. Zheng, and W.-K. Chu, J. Vac. Sci. Technol. A 13, 820 (1995).
8. D. M. Hoffman, S. P. Rangarajan, S. D. Athavale, S. C. Deshmukh, D. J. Economou, J.-R. Liu, Z. Zheng, and W.-K. Chu, J. Mater. Res. 9, 3019 (1994).
9. K. M. Waggoner, M. M. Olmstead, and P. P Power, Polyhedron 9, 257 (1990).
10. R. Jacobsson, Thin Solid Films 34, 191 (1976).
11. L. V. Interrante, W. Lee, M. McConnell, N. Lewis, and E. Hall, J. Electrochem. Soc. 136, 472 (1989).
12. D. C. Boyd, R. T. Haasch, D. R. Mantell, R. K. Schulze, J. F. Evans, and W. L. Gladfelter, Chem. Mater. 1, 119 (1989).
13. M. David, S. V. Babu, and D. H. Rasmussen, AIChE J. 36, 871 (1990).
14. F. Hasegawa, T. Takahashi, K. Kubo, and Y. Nannichi, Jpn. J. Appl. Phys. 26, 1555 (1987).
15. M. J. Almond, C. E. Jenkins, and D. A Rice, J. Organomet. Chem. 443, 137 (1993).
16. D. K. Gaskill, N. Bottka, and M. C. Lin, J. Cryst. Growth 77, 418 (1986).
17. H. Nomura, S. Meikle, Y. Nakanishi, and Y. Hatanaka, J. Appl. Phys. 69, 990 (1991).
18. S. Meikle, H. Nomura, Y. Nakanishi, and Y. Hatanaka, J. Appl. Phys. 67, 483 (1990).
19. W. K. Chu, J. W. Mayer, and M.-A. Nicolet, Backscattering Spectrometry (Academic, New York, 1978).
20. Z. Zheng, J.-R. Liu, X. T. Cui, W.-K. Chu, S. P. Rangarajan, and D. M. Hoffman, J. Mater. Res. 10, 3124 (1995).
21. A. Turos and O. Meyer, Nucl. Instrum. Methods Phys. Res. B 4, 92 (1984).
22. W. Baronian, Mater. Res. Bull. 7, 119 (1972).
23. J. Bauer, L. Biste, and D. Bolze, Phys. Status Solidi A 39, 173 (1977).
24. W. M. Yim, E. J. Stofko, P. J. Zanzucchi, J. I. Pankove, M. Ettenberg, and S. L. Gilbert, J. Appl. Phys. 44, 292 (1973).
25. G. A. Cox, D. C. Cummins, K. Kawabe, and R. H. Tredgold, J. Phys. Chem. Solids 28, 543 (1967).
26. J. N. Musher and R. G. Gordon, J. Electron. Mater. 20, 1105 (1991).
27. S. W. Choi, K. J. Bachmann, and G. Lucovsky, J. Mater. Res. 8, 847 (1993).
28. S. Zhang and D. E. Brodie, Thin Solid Films 237, 124 (1994).
29. P. J. Born and D. S. Robertson, J. Mater. Sci. 15, 3003 (1980).
30. J. Kouvetakis and D. B. Beach, Chem. Mater. 1, 476 (1989).
31. H. J. Hovel and J. J. Cuomo, Appl. Phys. Lett. 20, 71 (1972).