Chemical vapor deposition of aluminum and gallium nitride thin films from metalorganic precursors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 306-311

  Hoffman, David M ^a   Rangarajan, Sri Prakash ^a   Athavale, Satish D ^b   Economou, Demetre J ^b   Liu, Jia Rui ^b   Zheng, Zongshuang ^b   Chu, Wei Kan ^b  

^a University of Houston ^*  (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000178812     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579893     Document Type: Article

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