Low-temperature deposition of films from tetrakis(dimethylamido) titanium and ammonia

Thin Solid Films

Volumn 323, Issue 1-2, 1998, Pages 10-17

  Berry, Alan ^a   Mowery, Robert ^a   Turner, Noel H ^a   Seitzman, Larry ^a,b   Dunn, Derren ^a,c   Ladouceur, Harold ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b CATERPILLAR INC   (United States)

^c University of Virginia   (United States)

Author keywords

Chemical vapor deposition; Nanocrystallite; Tetrakis(dimethylamido)titanium (TDMAT)

Indexed keywords

AMMONIA; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW TEMPERATURE OPERATIONS; NANOSTRUCTURED MATERIALS; SUBSTRATES; THIN FILMS; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

TETRAKIS(DIMETHYLAMIDO)TITANIUM;

PROTECTIVE COATINGS;

EID: 0032096215     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00963-2     Document Type: Article

References (27)

1. G. Wahl, in: M.L. Hitchman, K.F. Jensen (Eds.), Chemical Vapor Deposition, Principles and Applications, Academic Press, 1993.
2. L.E. Toth, Transition Metal Carbides and Nitrides, Academic Press, 1971.
3. R. Fix, R.G. Gordon, D.M. Hoffman, Thin Solid Films 288 (1996) 116-119.
4. J.N. Musher, R.G. Gordon, J. Mater. Res. 11 (1996) 989-1001.
5. J.N. Musher, R.G. Gordon, J. Electrochem. Soc. 143 (1996) 736-744.
6. S.C. Sun, M.H. Tsai, Thin Solid Films 253 (1994) 440-444.
7. D.M. Hoffman, Polyhedron 13 (1994) 1169-1179.
8. L.H. Dubois, Polyhedron 13 (1994) 1329-1336.
9. R. Fix, R.G. Gordon, D.M. Hoffman, Chem. Mater. 5 (1993) 614-619.
10. J.A. Prybyla, C.-M. Chiang, L.H. Dubois, J. Electrochem. Soc. 140 (1993) 2695-2702.
11. L.H. Dubois, B.R. Zegarski, G.S. Girolami, J. Electrochem. Soc. 139 (1992) 3603-3609.
12. R.F. Fix, R.G. Gordon, D.M. Hoffman, Chem. Mater. 3 (1991) 1138-1148.
13. B.H. Weiller, J. Am. Chem. Soc. 118 (1996) 4975-4983.
14. TiN: Index card No. 38-1420, in: W.F. McClune (Ed.), Powder Diffraction File, JCPDS International Center for Diffraction Data, Swarthmore, PA.
15. A.J. Perry, M. Jagner, P.F. Woerner, W.D. Sproul, P.J. Rudnik, Surf. Coat. Technol. 43-44 (1990) 234-244.
16. J.F. Moulder, W.E. Stickle, P.E. Sobol, K.D. Bomben, in: J. Chastain (Ed.), Handbook of X-ray Photo-Electron Spectroscopy, Perkin-Elmer, 1992.
17. J.H. Scofield, J. Electron Spectrosc. 8 (1976) 129-137.
18. D.S. Campbell, in: L.I. Maissel, R. Glang (Ed.), Handbook of Thin Film Technology, McGraw-Hill, 1970.
19. R.C. Weast (Ed.), Handbook of Chemistry and Physics, 56th edn., CRC Press, 1975.
20. B. Bhushan, B.K. Gupta (Ed.), Handbook of Tribology: Materials, Coatings, and Surface Treatments, McGraw-Hill, 1991.
21. I.J. Raaijmakers, J. Yang, Appl. Surf. Sci. 73 (1993) 31-41.
22. G.J. Exarhos, N.J. Hess, Thin Solid Films 220 (1992) 254-260.
23. M.F. Lappert, P.P. Power, A.R. Sanger, R.C. Srivastava, Metal and Metalloid Amides, Ellis Horwood, 1980.
24. L.J. Bellamy, The Infrared Spectra of Complex Molecules, 3rd edn., Chapman and Hall, 1975.
25. D.V. Baxter, M.H. Chisholm, G.J. Gama, V.F. DiStasi, A.L. Hector, I.P. Parkin, Chem. Mater. 8 (1996) 1222-1228.
26. P. Gomez-Sal., A. Martin, M. Mena, C. Yelamos, J. Chem. Soc., Chem. Commun. (1995) 2185-2186.
27. E. Samuel, J.F. Harrod, J. Am. Chem. Soc. 106 (1984) 1859-1860.