Compositional effects on the degradation of PVD-TiSiN

Materials Research Society Symposium - Proceedings

Volumn 473, Issue , 1997, Pages 241-246

  McArthur, W F ^a   Deng, F ^a   Ring, K ^a   Pattison, P M ^a   Kavanagh, K L ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; COPPER; ELECTRON DIFFRACTION; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHASE SEPARATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON NITRIDE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION;

PLASMA VAPOR DEPOSITION (PVD);

METALLIC FILMS;

EID: 0031333656     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-473-241     Document Type: Conference Paper

References (5)